Frictional characteristics of nano-scale mesoporous SiO 2 thin film formed by sol-gel and self-assembly method

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 12, 2009, Pages 7340-7344

  Lee, Gyu Sun ^a   Shin, Yun Ha ^a   Kim, Ji Man ^a   Kim, Tae Sung ^a   Lee, Young Ze ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Friction; Mesoporous siO 2 thin film; Self Assembly Method; Sol Gel; Wear

Indexed keywords

BALL-ON-DISK; CETYLTRIMETHYLAMMONIUM BROMIDE; DRY CONDITION; FRICTION AND WEAR; FRICTION COEFFICIENTS; FRICTIONAL CHARACTERISTICS; MESOPOROUS; MESOPOROUS SIO 2 THIN FILM; NANO SCALE; POROUS STRUCTURES; SELF-ASSEMBLY METHOD; SURFACE FUNCTIONS; WEAR; WEAR PARTICLES; WEAR VOLUME;

AMMONIUM COMPOUNDS; CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; FRICTION; GELATION; GELS; MATERIALS PROPERTIES; MECHANICAL PROPERTIES; NANOTECHNOLOGY; PORE SIZE; SELF ASSEMBLY; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS; SURFACE ACTIVE AGENTS; THIN FILM DEVICES; THIN FILMS; TRIBOLOGY;

MESOPOROUS MATERIALS;

EID: 70350230417     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.1784     Document Type: Conference Paper

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