Effect of deposition temperature on the thin polymer film properties deposited by plasma enhanced CVD using cyclo-hexa-hydrocarbon as monomer

IEEJ Transactions on Fundamentals and Materials

Volumn 128, Issue 4, 2008, Pages

  Moriki, Kazunori ^a   Satoh, Tetsuji ^a   Itabashi, Atsushi ^a   Yumoto, Motoshige ^a  

^a TOKYO CITY UNIVERSITY   (Japan)

Author keywords

Amorphous hydrogenated carbon; Cyclo hexa hydrocarbon; Deposition rate; Plasma enhanced polymerization; Substrate temperature

Indexed keywords

ABSORPTION ENERGIES; AMORPHOUS HYDROGENATED CARBON; CYCLO-HEXA-HYDROCARBON; DEPOSITION FILMS; DEPOSITION TEMPERATURES; DOUBLE BONDS; FILM PROPERTIES; IN-VACUUM; LANGMUIR ADSORPTION ISOTHERMS; OPTICAL POLYMER WAVEGUIDES; PLASMA-CVD; PLASMA-ENHANCED CVD; RECIPROCAL TEMPERATURE; SUBSTRATE TEMPERATURE; SURFACE GEOMETRIES; TEMPERATURE DEPENDENCIES; THIN POLYMER FILMS;

ADSORPTION; ALGEBRA; AMORPHOUS CARBON; DANGLING BONDS; DEPOSITION; DEPOSITION RATES; GAS ABSORPTION; HYDROCARBONS; HYDROGENATION; LIGHT REFRACTION; MONOMERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYMER FILMS; POLYMERIZATION; POLYMERS; REFRACTIVE INDEX; REFRACTOMETERS; SUBSTRATES; THERMAL EFFECTS;

PLASMA DEPOSITION;

EID: 70350199951     PISSN: 03854205     EISSN: 13475533     Source Type: Journal    
DOI: 10.1541/ieejfms.128.268     Document Type: Article

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