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Volumn 45, Issue 10, 2009, Pages 4008-4010

Magnetic Anisotropy of FeCo Films Induced by Obliquely Sputtered Ru Underlayers

Author keywords

Multilayered media; thin films

Indexed keywords


EID: 70350130500     PISSN: 00189464     EISSN: 19410069     Source Type: Journal    
DOI: 10.1109/TMAG.2009.2024161     Document Type: Article
Times cited : (12)

References (11)
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    • Texture, microstructure, and magnetic properties of Fe-Co alloy films formed by sputtering at an oblique angle of incidence
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  • 5
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  • 6
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    • Strong anisotropy in thin magnetic films deposited on oblique sputtered Ta underlayers
    • R. D. McMichael, C. G. Lee, J. E. Bonevich, P. J. Chen, W. Miller, and W. F. Egelhoff, “Strong anisotropy in thin magnetic films deposited on oblique sputtered Ta underlayers,” J. Appl. Phys., vol. 88, p. 5296, 2000.
    • (2000) J. Appl. Phys. , vol.88 , pp. 5296
    • McMichael, R.D.1    Lee, C.G.2    Bonevich, J.E.3    Chen, P.J.4    Miller, W.5    Egelhoff, W.F.6
  • 7
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    • Magnetic and structural properties of Co films deposited onto oblique sputtered Pt underlayers
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    • Strong uniaxial magnetic anisotropy in CoFe films on obliquely sputtered Ru underlayer
    • submitted for publication
    • Y. Fukuma, Z. Lu, H. Fujiwara, G. Mankey, W. H. Butler, and S. Matsunuma, “Strong uniaxial magnetic anisotropy in CoFe films on obliquely sputtered Ru underlayer,” J. Appl. Phys., submitted for publication.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.