Interaction of cationic hydrophobic surfactants at negatively charged surfaces investigated by atomic force microscopy

Langmuir

Volumn 25, Issue 19, 2009, Pages 11509-11515

  Mcnamee, Cathy E ^a,b   Butt, Hans Jürgen ^a   Higashitani, Ko ^c   Vakarelski, Ivan U ^c,d   Kappl, Michael ^a  

^a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH   (Germany)

^b SHINSHU UNIVERSITY   (Japan)

^c KYOTO UNIVERSITY   (Japan)

^d INSTITUTE OF CHEMICAL AND ENGINEERING SCIENCES   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION PROCESS; AMMONIUM CHLORIDE; ATOMIC FORCE MICROSCOPY TIPS; ELECTROSTATIC CONTRIBUTIONS; FORCE CURVE; FUNCTIONALIZED; HEMIMICELLES; HYDROPHOBIC SURFACTANT; LOW CONCENTRATIONS; NACL CONCENTRATION; NEGATIVELY CHARGED SURFACES; OCTADECYL; PATCH STRUCTURE; POSITIVELY CHARGED; SILANE LAYERS; SILICA SURFACE; SURFACTANT BILAYER; TAPPING MODES; TRIMETHYL;

ADSORPTION; AMMONIUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; CATIONIC SURFACTANTS; CHARGED PARTICLES; CONCENTRATION (PROCESS); FORCE MEASUREMENT; NEGATIVE IONS; SILANES; SILICA;

SODIUM CHLORIDE;

EID: 70349900901     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la901414y     Document Type: Article

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