AFM surface force measurements conducted with silica in CnTACl solutions: Effect of chain length on hydrophobic force

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 300, Issue 3 SPEC. ISS., 2007, Pages 335-345

  Zhang, Jinhong ^a   Yoon, Roe Hoan ^a   Eriksson, Jan Christer ^b  

^a VIRGINIA POLYTECHNIC INSTITUTE AND STATE UNIVERSITY   (United States)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

CnTACl homologues; Charged patch; Film tension; Hydrophobic force; Long range attraction; Point of charge neutralization; Water structure

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; HYDROCARBONS; HYDROPHOBICITY; MATHEMATICAL MODELS; SURFACE ACTIVE AGENTS;

CHARGED PATCHS; FILM TENSION; HYDROPHOBIC FORCE; LONG RANGE ATTRACTION; POINT OF CHARGE NEUTRALIZATION; WATER STRUCTURE;

SILICA;

CARBON; HYDROCARBON; HYDROGEN; SILICON DIOXIDE; SURFACTANT;

ADHESION; ARTICLE; ATOMIC FORCE MICROSCOPY; CONCENTRATION (PARAMETERS); FILM; HYDROPHOBICITY; PRIORITY JOURNAL; SILYLATION; WATER STRUCTURE;

EID: 34247104086     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2007.01.048     Document Type: Article

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