Comparison of spectroscopic Mueller polarimetry, standard scatterometry and real space imaging techniques (SEM and 3D-AFM) for dimensional characterization of periodic structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6922, Issue , 2008, Pages

  De Martino, A ^a   Foldyna, M ^a   Novikova, T ^a   Cattelan, D ^b   Barritault, P ^c   Licitra, C ^c   Hazart, J ^c   Foucher, J ^c   Bogeat, F ^c  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b HORIBA LTD   (Japan)

^c CEA LETI   (France)

Author keywords

AFM; CD SEM; Diffraction gratings; Ellipsometry; Metrology; Mueller matrices; Polarimetry; Scatterometry

Indexed keywords

1D GRATING; AFM; AZIMUTHAL ANGLE; CD-SEM; CDS; CONSISTENCY TESTS; CROSS SECTION; DIMENSIONAL CHARACTERIZATION; EXPERIMENTAL COMPARISON; MUELLER; MUELLER MATRIX; MUELLER POLARIMETRY; REAL-SPACE; SCATTEROMETERS; SCATTEROMETRY; SIDEWALL ANGLES; SPECTRAL RANGE;

ATOMIC FORCE MICROSCOPY; IMAGING TECHNIQUES; METEOROLOGICAL INSTRUMENTS; POLARIMETERS; PROCESS CONTROL; SPECTROSCOPIC ELLIPSOMETRY; STANDARDS; UNITS OF MEASUREMENT;

PERIODIC STRUCTURES;

EID: 70349743618     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772721     Document Type: Conference Paper

References (4)

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2. M. G. Moharam and T. K. Gaylord, "Diffraction analysis of dielectric surface-relief gratings, " J. Opt. Soc. Am. 72, 1385-1392 (1982). (Pubitemid 13461891)
3. A. De Martino et al., "Decorrelation of fitting parameters by Mueller polarimetry in conical diffraction, " Microlithography 2006, Proc. SPIE 6152, 615253.
4. T. Novikova et al., . "Application of Mueller polarimetry in conical diffraction for CD measurements in microelectronics" Applied Optics 45, 3688 (2006).