Surface and chemical characterization of polyLA thin films fabricated using plasma polymerization

Chemical Vapor Deposition

Volumn 15, Issue 7-9, 2009, Pages 179-185

  Easton, Christopher D ^a   Jacob, Mohan V ^a   Shanks, Robert A ^b   Bowden, Bruce F ^a  

^a JAMES COOK UNIVERSITY   (Australia)

^b RMIT UNIVERSITY   (Australia)

Author keywords

AFM; Chemical structure; FTIR; Plasma polymer; Thin films

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPES; CHEMICAL CHARACTERISTIC; CHEMICAL CHARACTERIZATION; CHEMICAL STRUCTURE; FT-IR SPECTRUM; FTIR; LAVANDULA ANGUSTIFOLIA; PLASMA POLYMER; POLYMER THIN FILMS; POLYMERIZATION PROCESS; POLYMERIZATION REACTION; RF-POWER; UV IRRADIATION; WATER CONTACT ANGLE MEASUREMENT;

ANGLE MEASUREMENT; AROMATIC HYDROCARBONS; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; ESSENTIAL OILS; FABRICATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FUNCTIONAL GROUPS; FUNCTIONAL POLYMERS; ION BOMBARDMENT; NUCLEAR MAGNETIC RESONANCE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; OLEFINS; PLASMA POLYMERIZATION; PLASMAS; POLYMERS; STRUCTURE (COMPOSITION); SURFACE MORPHOLOGY; THIN FILMS;

POLYMER FILMS;

EID: 70349610814     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200806719     Document Type: Article

References (19)

1. Z. V. Vardeny, A. J. Heeger, A. Dodabalapur, Synth. Met. 2005, 1, 1.
2. A. Hiratsuka, I. Karube, Electroanalysis 2000, 9, 695.
3. R. Shellie, L. Mondello, P. Marriott, G. Dugo, J. Chrom. 2002, 1-2, 225.
4. T. J. Morgan, W. E. Morden, E. Al-Muhareb, A. A. Herod, R. Kan- diyoti, Energy Fuels 2006, 2, 734.
5. R. Shellie, P. Marriott, C. Cornwell, J. High Resolut. Chrom. 2000, 9, 554.
6. M. V. Jacob, C. D. Easton, G. S. Woods, C. C. Berndt, Thin Solid Films 2008, 12, 3884.
7. J. Coates, in: Encyclopedia of Analytical Chemistry, (Ed: R. A. Meyers), John Wiley & Sons Ltd, Chichester 2000, p. 10815.
8. A. Hollander, J. Thome, in: Plasma Polymer Films, (Ed: H. Biederman), Imperial College Press, London 2004, p. 248.
9. A. Hollander, J. Thome, in: Plasma Polymer Films, (Ed: H. Biederman), Imperial Collage Press, London 2004, p. 252.
10. H. Yasuda, Luminous Chemical Vapor Deposition and Interface Engineering, Marcel Dekker, New York 2005.
11. G. P. Lopez, B. D. Ratner, Langmuir 1991, 4, 766.
12. A. v, Keudell, W. Moller, J. Appl. Phys. 1994, 12, 7718.
13. H. Kersten, H. Deutsch, H. Steffen, G. M. W. Kroesen, R. Hippler, Vacuum 2001, 3, 385.
14. D. Hegemann, M. M. Hossain, E. Korner, D. J. Balazs, Plasma Processes. Polym. 2007, 3, 229.
15. T. B. Casserly, K. K. Gleason, Chem. Vap. Deposition 2006, 1, 59.
16. R. M. Silverstein, F. X. Webster, D. J. Kiemle, Spectrometric Identification of Organic Compounds, John Wiley & Sonds, Inc, Hoboken, NJ 2005.
17. M. R. Alexander, T. M. Duc, Polymer 1999, 20, 5479.
18. S. Kurosawa, N. Kamo, N. Minoura, M. Muratsugu, Mater. Sci. Eng. C 1997, 4, 291.
19. M. C. Kim, S. H. Cho, J. G. Han, B. Y. Hong, Y J. Kim, S. H. Yang, J. H. Boo, Surf. Coat. Technol. 2003, 595.