Selective chemical vapor deposition of cu on octadecyltrisilane (OTS)-patterned indium tin oxide (ITO) substrates and the evaluation of contact resistance of Cu-ITO interfaces using a transmission line model (TLM) technique

Electronic Materials Letters

Volumn 4, Issue 4, 2008, Pages 181-183

  Park, Heejung ^a   Go, Seunghee ^a   Lee, Kwanwoo ^a   Lee, Jaegab ^a  

^a Kookmin University   (South Korea)

Author keywords

Contact resistance; OTS; Selective Cu deposition

Indexed keywords

EID: 70349429971     PISSN: 17388090     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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