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Volumn 38, Issue 17, 2005, Pages 3242-3250

Radiation resistance of quartz glass for VUV discharge lamps

Author keywords

[No Author keywords available]

Indexed keywords

DISCHARGE LAMPS; FUSED SILICA; MATHEMATICAL MODELS; PHOTOLUMINESCENCE; RADIATION EFFECTS; THERMAL EFFECTS; XENON;

EID: 24144500837     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/17/S28     Document Type: Conference Paper
Times cited : (31)

References (27)
  • 14
    • 0027663836 scopus 로고
    • A review of the chemical reaction mechanism and kinetics for hydrofluoric acid etching of silicon dioxide for surface micromachining applications
    • Monk D J, Soane D S and Howe R T 1993 A review of the chemical reaction mechanism and kinetics for hydrofluoric acid etching of silicon dioxide for surface micromachining applications Thin Films 232 1-12
    • (1993) Thin Films , vol.232 , Issue.1 , pp. 1-12
    • Monk, D.J.1    Soane, D.S.2    Howe, R.T.3
  • 21
    • 33645601987 scopus 로고    scopus 로고
    • Photosensitivity in optical Waveguides and glasses
    • Skuja L 1998 Photosensitivity in optical Waveguides and glasses Lectures of the Summer School (Vitznau, Switzerland)
    • (1998) Lectures of the Summer School
    • Skuja, L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.