Effect of interlayer on thermal stability of nickel silicide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1595-1599

  Maa, Jer Shen ^a   Ono, Yoshi ^a   Tweet, Douglas J ^a   Zhang, Fengyan ^a   Hsu, Sheng Teng ^a  

^a SHARP LABORATORIES OF AMERICA   (United States)

Author keywords

NiSi2

Indexed keywords

EID: 70349132276     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.1372916     Document Type: Conference Paper

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