Effect of electron beam writing parameters for ferroelectric domain structuring LiNbO3:Nd3+

Optical Materials

Volumn 31, Issue 12, 2009, Pages 1777-1780

  Molina, P ^a   Ramirez M O ^a   Garcia Sole J ^a   Bausa L E ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

Electron lithography; Ferroelectric domain inversion; Laser material

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONS; FERROELECTRIC MATERIALS; LITHIUM COMPOUNDS; NEODYMIUM COMPOUNDS; NIOBIUM COMPOUNDS; OPTICAL PROPERTIES; SINGLE CRYSTALS; SOLID STATE LASERS; TEMPERATURE;

ACCELERATING VOLTAGES; DIRECT ELECTRON BEAM WRITING; ELECTRON BEAM WRITING; FERROELECTRIC CRYSTAL; FERROELECTRIC DOMAINS; LASER MATERIALS; OPTICAL SPECTROSCOPY; OPTICALLY ACTIVE DEFECTS;

FERROELECTRICITY;

EID: 70349127373     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2008.12.033     Document Type: Article

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