Characterization of an N2 flowing microwave post-discharge by OES spectroscopy and determination of absolute ground-state nitrogen atom densities by TALIF

Journal of Physics D: Applied Physics

Volumn 42, Issue 13, 2009, Pages

  Es Sebbar, Et ^a   Benilan, Y ^a   Jolly, A ^a   Gazeau, M C ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC DENSITY; EXPERIMENTAL CONDITIONS; GAS TEMPERATURE; LASER INDUCED FLUORESCENCE; NITROGEN ATOM; OPTICAL EMISSIONS; POST-DISCHARGE; QUARTZ TUBES; TIME SPENT; TWO-PHOTON ABSORPTIONS; WALL RECOMBINATION;

ATOMIC SPECTROSCOPY; ATOMS; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; GAS ABSORPTION; GROUND STATE; KRYPTON; LEAKAGE (FLUID); LIGHT EMISSION; MICROWAVES; MULTIPHOTON PROCESSES; NITROGEN; OPTICAL EMISSION SPECTROSCOPY; OXIDE MINERALS; QUARTZ;

ABSORPTION SPECTROSCOPY;

EID: 70249098115     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/13/135206     Document Type: Article

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