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Volumn , Issue , 2008, Pages
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Fabrication of InP HEMT devices with extremely high Fmax
a a a a a a a a a a a b b b |
Author keywords
[No Author keywords available]
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Indexed keywords
GATE LENGTH;
INP HEMT;
HIGH ELECTRON MOBILITY TRANSISTORS;
INDIUM;
INDIUM PHOSPHIDE;
MICROWAVE CIRCUITS;
MONOLITHIC MICROWAVE INTEGRATED CIRCUITS;
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EID: 70149093940
PISSN: 10928669
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/ICIPRM.2008.4703057 Document Type: Conference Paper |
Times cited : (38)
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References (6)
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