Growth of porous type anodic oxide films at micro-areas on aluminum exposed by laser irradiation

Electrochimica Acta

Volumn 54, Issue 27, 2009, Pages 7018-7024

  Kikuchi, Tatsuya ^a   Sakairi, Masatoshi ^a   Takahashi, Hideaki ^b  

^a HOKKAIDO UNIVERSITY   (Japan)

^b ASAHIKAWA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Aluminum; Anodizing; Laser irradiation; Micro fabrication

Indexed keywords

ANODIC OXIDE FILM; ANODIC OXIDES; ANODIZING; CHEMICAL DISSOLUTION; IRRADIATED AREA; LASER IRRADIATION; LASER IRRADIATIONS; LONG LINE; LONGITUDINAL DIRECTION; LOWER SOLUTION; MEASURED CURRENTS; MORPHOLOGICAL CHANGES; ND-YAG LASERS; OXALIC ACID SOLUTION; PORE-SEALING; POTENTIOSTATICS; RE-ANODIZING; TIME VARIATIONS; VOLUME EXPANSION;

ACID RESISTANCE; ALUMINA; ALUMINUM; DISSOLUTION; IRRADIATION; LASER BEAM EFFECTS; LASERS; NEODYMIUM LASERS; PULSED LASER APPLICATIONS;

OXIDE FILMS;

EID: 69949186810     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.07.026     Document Type: Article

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