Electrochemical codeposition of copper and manganese from room-temperature N-butyl-N-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide ionic liquid

Electrochimica Acta

Volumn 54, Issue 27, 2009, Pages 6935-6940

  Chen, Po Yu ^a   Deng, Ming Jay ^b   Zhuang, Ding Xuan ^a  

^a KAOHSIUNG MEDICAL UNIVERSITY   (Taiwan)

^b NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Bis(trifluoromethylsulfonyl)imide; Cu Mn codeposition; Electrodeposition; Ionic liquid; Room temperature

Indexed keywords

ALLOY COATINGS; ANODIC DISSOLUTION; AQUEOUS SOLUTIONS; BIS(TRIFLUOROMETHYLSULFONYL)IMIDE; CONCENTRATION RATIO; CONTROLLED-POTENTIAL ELECTROLYSIS; COPPER-MANGANESE ALLOY COATINGS; CRYSTALLINE STRUCTURE; CU-MN CODEPOSITION; DEPOSITION POTENTIAL; ELECTROCHEMICAL CODEPOSITION; METALLIC ELECTRODES; OXIDATION CURRENTS; PASSIVE BEHAVIOR; ROOM TEMPERATURE; VOLTAMMETRIC BEHAVIORS;

ALLOYS; COATINGS; DISSOLUTION; ELECTRODEPOSITION; ELECTRODES; IONIC LIQUIDS; IONIZATION OF LIQUIDS; IONS; MANGANESE; MANGANESE ALLOYS; MANGANESE COMPOUNDS; OXIDATION; SODIUM CHLORIDE;

COPPER ALLOYS;

EID: 69949118483     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.07.016     Document Type: Article

References (24)

1. McMurray C.T., and Tainer J.A. Nat. Genet. 34 (2003) 239
2. De A.K. Environmental Chemistry (1994), New Age International, New Delhi
3. Dobson S. Cadmium-Environmental Aspects (1992), World Health Organization, Geneva
4. Nordberg G.F., Herber R.F.M., and Alessio L. Cadmium in the Human Environment: Toxicity and Carcinogenicity (1992), Oxford University Press, Oxford
5. Henry R., and Eugene H. Biological Chemistry (1971), Harper and Row, New York
6. Mertens J., Degryse F., Springael D., and Smolders E. Environ. Sci. Technol. 41 (2007) 2992
7. Voegelin A., Pfister S., Scheinost A.C., Marcus M.A., and Kretzschmar R. Environ. Sci. Technol. 39 (2005) 6616
8. Callender E., and Rice K.C. Environ. Sci. Technol. 34 (2000) 232
9. Gong J., and Zangari G. J. Electrochem. Soc. 149 (2002) C209
10. Brenner A. Electrodeposition of Alloys (1963), Academic Press, New York
11. Potter E.V., Lukens H.C., and Huber R.W. Trans. AIME 185 (1949) 399
12. Potter E.V., and Huber R.W. Phys. Rev. 68 (1945) 24
13. Mho S.-I., and Johnson D.C. J. Electroanal. Chem. 500 (2001) 524
14. Mho S.-I., and Johnson D.C. J. Electroanal. Chem. 495 (2001) 152
15. Mangolini F., Magagnin L., and Cavallotti P.L. J. Electrochem. Soc. 153 (2006) C623
16. Gong J., Wei G., Barnard J.A., and Zangari G. Metall. Mater. Trans. A 36A (2005) 2705
17. Gong J., and Zangari G. J. Electrochem. Soc. 151 (2004) C297
18. Zhuang D.-X., Deng M.-J., Chen P.-Y., and Sun I.-W. J. Electrochem. Soc. 155 (2008) D575
19. Deng M.-J., Chen P.-Y., and Sun I.-W. Electrochim. Acta 53 (2007) 1931
20. Chen P.-Y., and Hussey C.L. Electrochim. Acta 52 (2007) 1857
21. MacFarlane D.R., Meakin P., Sun J., Amini N., and Forsyth M. J. Phys. Chem. B 103 (1999) 4164
22. Zein El Abedin S., Saad A.Y., Farag H.K., Borisenko N., Liu Q.X., and Endres F. Electrochim. Acta 52 (2007) 2746
23. Zein El Abedin S., Borisenko N., and Endres F. Electrochem. Commun. 6 (2004) 510
24. Zein El Abedin S., Farag H.K., Moustafa E.M., Welz-Biermann U., and Endres F. Phys. Chem. Chem. Phys. 7 (2005) 2333