Electrodeposition and characterization of sacrificial copper-manganese alloy coatings: Part II. Structural, mechanical, and corrosion-resistance properties

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 36, Issue 10, 2005, Pages 2705-2715

  Gong, Jie ^a   Wei, Guohua ^a,b   Barnard, John A ^c   Zangari, Giovanni ^d  

^a University of Alabama   (United States)

^b OHIO STATE UNIVERSITY   (United States)

^c University of Pittsburgh   (United States)

^d University of Virginia   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC POLARIZATION; COATINGS; CORROSION RESISTANCE; CRYSTAL STRUCTURE; ELECTRODEPOSITION; MECHANICAL PROPERTIES; NUCLEATION; PHASE TRANSITIONS; RECRYSTALLIZATION (METALLURGY); SCANNING ELECTRON MICROSCOPY; STAINLESS STEEL; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS COATINGS; COPPER-MANGANESE ALLOY COATINGS; JOHNSON-MEHL-AVRAMI-KOLMOGOROV EQUATION;

COPPER ALLOYS;

EID: 27144538853     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-005-0267-0     Document Type: Article

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