Progress of nil template making

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6792, Issue , 2008, Pages

  Yusa, Satoshi ^a   Hiraka, Takaaki ^a   Kobiki, Ayumi ^a   Sasaki, Shiho ^a   Itoh, Kimio ^a   Toyama, Nobuhito ^a   Kurihara, Masaaki ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

hp22nm; Nano imprint; Resolution; Template

Indexed keywords

CADMIUM COMPOUNDS; ELECTRON BEAM LITHOGRAPHY; OPTICAL DESIGN; PHOTORESISTS; ROUGHNESS MEASUREMENT; STANDARDS;

CRITICAL ISSUES; DOT PATTERNS; EUROPEAN; GLOBAL PATTERNS; HIGH RESOLUTIONS; HOLE PATTERNS; IMAGE-PLACEMENT (IP); INDUSTRY STANDARDS; LINE AND SPACE PATTERNS; LINE-EDGE ROUGHNESS (LER); MAKING PROCESS; NANO IMPRINT LITHOGRAPHY (NIL); PROCESS CONDITIONS; RESOLUTION LIMITS; TEMPLATE FABRICATION; VERTICAL DEPTH;

NANOIMPRINT LITHOGRAPHY;

EID: 45549095321     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. S. Sasaki, K. Itoh, A. Fujii, N. Toyama, H. Mohri, N. Hayashi, "Photomask development for next generation lithography," Proceeding of SPIE, vol. 5853, pp.277-288, 2005.
2. S. Sasaki, Y. Yoshida, T. Amano, K. Itoh, N. Toyama, H. Mohri, N. Hayashi, "Patterning process development for NIL template," GMMFachbericht, vol. 49 (22nd European Mask and Lithography Conference,) pp.203-206, 2006.
3. Y. Yoshida, T. Amano, S. Sasaki, K. Itoh, N. Toyama, H. Mohri, N. Hayashi, "Dry etch technology development for NIL template," Proceeding of SPIE, vol. 6283, 62833G, 2006.
4. Y.Yoshida, A. Kobiki, T. Hiraka, S. Yusa, S. Sasaki, K. Itoh, N. Toyama, M. Kurihara, H. Mohri, N. Hayashi, "NIL template making and imprint evaluation," Proceeding of SPIE, vol. 6349, 63492C, 2006.
5. M. Ishikawa, M. Sakaki, H. Fujita, H. Sano, M. Hoga, N. Hayashi, "Hybrid EB-writing technique with a 50kV-VSB writer and a 100kV-SB writer for NIL mold fabrication," Proceeding of SPIE, vol. 6607, to be printed