Study of the mechanical properties of CeO2 layers with the nanoindentation technique

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 227-232

  Roa, J J ^a   Gilioli, E ^b   Bissoli, F ^b   Pattini, F ^b   Rampino, S ^b   Capdevila, X G ^a   Segarra, M ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

^b IMEM CNR   (Italy)

Author keywords

CeO2 buffer layers; Hardness; Mechanical properties; Nanoindentation technique; Thin films; Young's modulus

Indexed keywords

APPLIED LOADS; CEO2 BUFFER LAYERS; COATED CONDUCTORS; DEPOSITION PROCESS; DOPING AGENT; MECHANICAL CHARACTERIZATIONS; NANOINDENTATION TECHNIQUE; NANOINDENTATION TECHNIQUES; PULSED ELECTRON DEPOSITION; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPY IMAGE; SHARP INDENTATION; SMALL DEVICES; YOUNG'S MODULUS;

BUFFER LAYERS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); DOPING (ADDITIVES); ELASTIC MODULI; ELASTICITY; FRACTURE TOUGHNESS; HARDNESS; MECHANICAL STABILITY; NANOINDENTATION; SCANNING ELECTRON MICROSCOPY; TANTALUM; THIN FILMS; ZIRCONIUM;

MECHANICAL PROPERTIES;

EID: 69549103167     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.132     Document Type: Article

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