Change in the structure and dielectric properties of niobium anodic oxide films during potentiostatic anodizing

Electrochemistry

Volumn 72, Issue 9, 2004, Pages 624-632

  Nagahara, Kazuhiro ^a   Sakairi, Masatoshi ^a   Takahashi, Hideaki ^a   Matsumoto, Kazuyoshi ^b   Takayama, Koichi ^b   Oda, Yukio ^b  

^a HOKKAIDO UNIVERSITY   (Japan)

^b Cabot Supermetals KK   (Japan)

Author keywords

Anodic Oxide Film; Crystallization; Dielectric Dispersion; Micro Structure; Niobium

Indexed keywords

ANODES; ANODIC OXIDATION; CHEMICAL POLISHING; CRYSTAL DEFECTS; CRYSTALLIZATION; ELECTRIC POTENTIAL; MICROSTRUCTURE; NICKEL COMPOUNDS; PERMITTIVITY; PHOSPHORIC ACID;

ANODIC OXIDE FILMS; GALVANOSTATIC ANODIZING; POTENTIOSTATIC ANODIZING;

METALLIC FILMS;

EID: 6944243975     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.72.624     Document Type: Review

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