Cathodic electrophoretic deposition of manganese dioxide films

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 348, Issue 1-3, 2009, Pages 248-253

  Li, J ^a   Zhitomirsky, I ^a  

^a MCMASTER UNIVERSITY   (Canada)

Author keywords

Capacitance; Electrophoretic deposition; Film; Manganese dioxide; Phosphate ester; Supercapacitor

Indexed keywords

CAPACITANCE; CAPACITORS; CYCLIC VOLTAMMETRY; ELECTRIC POTENTIAL; ELECTROPHORESIS; ESTERIFICATION; ESTERS; MANGANESE; MANGANESE COMPOUNDS; SODIUM; WINDOWS;

CAPACITIVE BEHAVIOR; CHARGE STORAGE; CHRONOPOTENTIOMETRY; DEPOSITION EFFICIENCIES; DEPOSITION MECHANISM; DEPOSITION VOLTAGE; ELECTROCHEMICAL SUPERCAPACITOR; ELECTROPHORETIC DEPOSITION; ELECTROPHORETIC DEPOSITIONS; MANGANESE DIOXIDE; NANOSTRUCTURED FILMS; PHOSPHATE ESTER; PHOSPHATE ESTERS; SCAN RATES; SPECIFIC CAPACITANCE; SUPERCAPACITOR; VOLTAGE WINDOW;

DEPOSITION;

MANGANESE DIOXIDE; NANOFILM; ORGANOPHOSPHATE;

ARTICLE; CHEMICAL REACTION KINETICS; CONCENTRATION (PARAMETERS); CONTROLLED STUDY; ELECTRIC CAPACITANCE; ELECTRIC POTENTIAL; ELECTRODE; ELECTROPHORETIC DEPOSITION; NANOENGINEERING; NANOFABRICATION; PRIORITY JOURNAL;

EID: 69249206565     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2009.07.035     Document Type: Article

References (51)

1. Put S., Vleugels J., Anné G., and Van der Biest O. Colloids Surf. A: Physicochem. Eng. Aspects 222 (2003) 223
2. Van der Biest O., and Vandeperre L.J. Annu. Rev. Mater. Sci. 29 (1999) 327
3. De Riccardis M.F., Carbone S., Piscopiello E., and Anrisari M.V. Appl. Surf. Sci. 254 (2008) 1830
4. Tabellion J., and Clasen R. J. Mater. Sci. 39 (2004) 803
5. Boccaccini A.R., and Zhitomirsky I. Curr. Opin. Solid State Mater. Sci. 6 (2002) 251
6. Ferrari B., and Moreno R. J. Eur. Ceram. Soc. 17 (1997) 549
7. Cao G. J. Phys. Chem. B 108 (2004) 19921
8. Tada E., and Frankel G.S. J. Electrochem. Soc. 154 (2007) C318
9. Ferrari B., and Moreno R. J. Electrochem. Soc. 147 (2000) 2987
10. Kaya C., Singh I., and Boccaccini A.R. Adv. Eng. Mater. 10 (2008) 131
11. Cheong M., and Zhitomirsky I. Colloids Surf. A: Physicochem. Eng. Aspects 328 (2008) 73
12. Cheong M., and Zhitomirsky I. Surf. Eng. 25 (2009) 346
13. Zhao H., Song H., Li Z., Yuan G., and Jin Y. Appl. Surf. Sci. 251 (2005) 242
14. Hyam R.S., Subhedar K.M., and Pawar S.H. Appl. Surf. Sci. 253 (2006) 1540
15. Ochsenkühn-Petropoulou M., Argyropoulou R., Tarantilis P., Vottea I., Ochsenkühn K.M., and Parissakis G. J. Mater. Process. Technol. 108 (2001) 179
16. Ma H., Zhang L., Zhang J., Zhang L., Yao N., and Zhang B. Appl. Surf. Sci. 251 (2005) 258
17. Jang J.H., Kato A., Machida K., and Naoi K. J. Electrochem. Soc. 153 (2006) A321
18. Jang J.H., Machida K., Kim Y., and Naoi K. Electrochim. Acta 52 (2006) 1733
19. Zhitomirksy I. Adv. Colloid Interface Sci. 97 (2002) 279
20. Limmer S.J., Chou T.P., and Cao G.Z. J. Sol Gel Sci. Technol. 36 (2005) 183
21. Limmer S.J., and Cao G. Adv. Mater. 15 (2003) 427
22. Zhitomirsky I., and Petric A. J. Mater. Sci. 39 (2004) 825
23. Zhitomirsky I., and Petric A. J. Eur. Ceram. Soc. 20 (2000) 2055
24. Hill L.I., Portal R., Verbaere A., and Guyomard D. Electrochem. Solid-State Lett. 4 (2001) A180
25. Bai L., Qu D.Y., Conway B.E., Zhou Y.H., Chowdhury G., and Adams W.A. J. Electrochem. Soc. 140 (1993) 884
26. Das D., Sen P.K., and Das K. J. Appl. Electrochem. 36 (2006) 685
27. Xu J.-J., Luo X.-L., Du Y., and Chen H.-Y. Electrochem. Commun. 6 (2004) 1169
28. Moses Jacob G., and Zhitomirsky I. Appl. Surf. Sci. 254 (2008) 6671
29. Wu M.-S., Chiang P.-C.J., Lee J.-T., and Lin J.-C. J. Phys. Chem. B 109 (2005) 23279
30. Khomenko V., Raymundo-Piñero E., Frackowiak E., and Béguin F. Appl. Phys. A 82 (2006) 567
31. Chang J.-K., and Tsai W.-T. J. Appl. Electrochem. 34 (2004) 953
32. Chin S.-F., Pang S.-C., and Anderson M.A. J. Electrochem. Soc. 149 (2002) A379
33. Murray J.W., Balistrieri L.S., and Paul B. Geochim. Cosmochim. Acta 48 (1984) 1237
34. Ma Y., Luo J., and Suib S.L. Chem. Mater. 11 (1999) 1972
35. Ching S., Petrovay D.J., Jorgensen M.L., and Suib S.L. Inorg. Chem. 36 (1997) 883
36. Damodaran R., and Moudgil B.M. Colloids Surf. A 80 (1993) 191
37. Zhitomirsky I., and Petric A. Proceedings of 1st International Conference on Electrophoretic Deposition. Banff, Canada (2002) 222
38. Mikeska K., and Cannon W.R. In: Mangels J.A., and Messing G.L. (Eds). Advances in Ceramics. Forming of Ceramics vol. 9 (1984), American Ceramic Society, Columbus, OH 164
39. Cannon W.R., Becker R., and Mikeska K.R. In: Yan M.F., Niwa K., O'Bryan Jr. H.M., and Young W.S. (Eds). Advances in Ceramics. Ceramic Substrates and Packages for Electronic Applications vol. 26 (1989), American Ceramics Society, Westerville, OH 525
40. Mikeska K.R., and Cannon W.R. Colloids Surf. 29 (1988) 305
41. Biesheuvel P.M., and Verweij H. J. Am. Ceram. Soc. 82 (1999) 1451
42. Deng Z.-Y., She J., Inagaki Y., Yang J.-F., Ohji T., and Tanaka Y. J. Eur. Ceram. Soc. 24 (2004) 2055
43. Nakamura T., and Wang Z. Trans. ASME 68 (2001) 242
44. Nam K.-W., and Kim K.-B. J. Electrochem. Soc. 153 (2006) A81
45. Raymundo-Piñero E., Khomenko V., Frackowiak E., and Béguin F. J. Electrochem. Soc. 152 (2005) A229
46. Chang J.-K., and Tsai W.-T. J. Electrochem. Soc. 150 (2003) A1333
47. Conway B.E., and Pell W.G. J. Power Sources 105 (2002) 169
48. Pell W.G., Zolfaghari A., and Conway B.E. J. Electroanal. Chem. 532 (2002) 13
49. Rafik F., Gualous H., Gallay R., Crausaz A., and Berthon A. J. Power Sources 165 (2007) 928
50. Sawai K., and Ohzuku T. J. Electrochem. Soc. 144 (1997) 988
51. Kötz R., and Carlen M. Electrochim. Acta 45 (2000) 2483