The formation, imaging, and application of thin silicon-dioxide membrane

Electrochimica Acta

Volumn 54, Issue 25, 2009, Pages 5998-6002

  Sugino, Rinji ^a   Ito, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Chlorine radicals; Membrane; MEMS; Native oxide; Si etching; Si surface; Silicon dioxide

Indexed keywords

FILM DEPOSITION; NATIVE OXIDE; NATIVE OXIDE FILM; NATIVE OXIDES; NOVEL TECHNIQUES; SELECTIVE ETCHING; SEM; SEMICONDUCTOR MANUFACTURING; SEQUENTIAL PROCESS; SI ETCHING; SI SURFACE; SI SURFACES; SILICON-DIOXIDE; SOLID-STATE CIRCUITS; WET CHEMICAL TREATMENT;

CHLORINE; ETCHING; GAS PERMEABLE MEMBRANES; MEMS; MICROELECTROMECHANICAL DEVICES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SEPARATION; SILICON COMPOUNDS; SILICON OXIDES; THREE DIMENSIONAL;

SEMICONDUCTING SILICON;

EID: 69249125353     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.03.041     Document Type: Article

References (12)

1. Hattori T., Takase K., Yamagishi H., Sugino R., Nara Y., and Ito T. Jpn. J. Appl. Phys. 28 (1989) L296
2. Sugiyama K., Igarashi T., Moriki K., Nagasawa Y., Aoyama T., Sugino R., Ito T., and Hattori T. Jpn. J. Appl. Phys. 29 (1990) L2401
3. Ogawa H., Terada N., Sugiyama K., Moriki K., Miyata N., Aoyama T., Sugino R., Ito T., and Hattori T. Appl. Surf. Sci. 56-58 (1992) 836
4. Sugino R., Nara Y., Horie H., and Ito T. J. Appl. Phys. 76 (1994) 5498
5. Arikado T., Sekine M., Okano H., and Horiike Y. Abst, 1983 MRS Fall Meeting; Laser Chemical Processing of Semiconductor Device (1983) 408
6. Striemer C.C., Gaborski T.R., McGrath J.L., and Fauchet P.M. Nature 445 (2007) 749
7. Sugino R., and Ito T. Technical Digest of IEDM (2006) 529
8. USPatent; 5,662,814.
9. Agah M., and Wise K.D. Technical Digest of IEDM (2005) 305
10. Liu W., Vichienchom K., Clements M., DeMarco S., Hughes C., McGcken E., Humayun M., de Juan E., Weiland J.D., and Greenberg R. J. Solid-State Circuits 35 (2000) 1487
11. Hamaguchi K., Tsuchiya T., Shimaoka K., and Funabashi H. Micro electro mechanical systems. 17th IEEE International Conference on (MEMS) (2004) 418
12. Kendall D.K. J. Vac. Sci. Technol. A8 (1990) 3598