Effects of microwave radiation on electrodeposition processes at tin-doped indium oxide (ITO) electrodes

Electrochimica Acta

Volumn 54, Issue 26, 2009, Pages 6680-6685

  Rassaei, Liza ^a   Vigil, Elena ^b   French, Robert W ^a   Mahon, Mary F ^a   Compton, Richard G ^c   Marken, Frank ^a  

^a University of Bath   (United Kingdom)

^b UNIVERSITY OF HAVANA   (Cuba)

^c UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Electrodeposition; Electroplating; Gold; Microwave activation; Titanium dioxide; Voltammetry

Indexed keywords

ACETATE BUFFERS; AQUEOUS SOLUTIONS; BULK SOLUTIONS; CONVENTIONAL HEATING; DENSE FILMS; ELECTRODE SURFACES; ELECTRODEPOSITION PROCESS; FILM ELECTRODES; IN-SITU; ITO FILMS; LOCALIZED HEATING; METAL OXIDES; MICROWAVE ACTIVATION; MICROWAVE RADIATIONS; REDOX SYSTEMS; SURFACE TEMPERATURES; TEMPERATURE SENSITIVE; TETRACHLOROAURATE; TIN DOPED INDIUM OXIDE;

ATMOSPHERIC TEMPERATURE; DEPOSITS; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; GOLD; HEATING; INDIUM; INDIUM COMPOUNDS; MICROWAVES; PHOTOCURRENTS; RADIATION EFFECTS; SURFACE PROPERTIES; TIN; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VOLTAMMETRY;

OXIDE FILMS;

EID: 69249125034     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2009.06.062     Document Type: Article

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