Reactive sputtering deposition of photocatalytic TiO2 thin films on glass substrates

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2005, Pages 673-674

  Tavares, C J ^a   Vieira, J ^a   Rebouta, L ^a   Hungerford, G ^a   Coutinho, P ^a  

^a UNIVERSITY OF MINHO   (Portugal)

Author keywords

Photocatalysis; Reactive sputter deposition; Self cleaning glass coatings; TiO2

Indexed keywords

GLASS; INDUSTRIAL APPLICATIONS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PHOTOCHEMICAL REACTIONS; TITANIUM OXIDES;

REACTIVE SPUTTER DEPOSITION; SELF-CLEANING GLASS COATINGS; TIO2;

THIN FILMS;

EID: 33644977144     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. Fugishima and K. Honda, Nature, 238, 37, 1972.
2. A. Mills and S.LeHunte, J. Photochem. Photobiol. A, 108, 1, 1997.
3. Y. Ma and J. Yao, J. Photochem. Photobiol. A, 116, 167, 1998.
4. Y. Li, G. Lu and S. Li, J. Photochem. Photobiol. A, 152, 219, 2002.
5. S.K. Zheng, T.M. Wang, G. Xiang and C. Wang, Vacuum, 62, 361, 2001.
6. B. Kraeutler and A.J. Bard, J. Am. Chem. Soc., 100, 4317, 1978.
7. W. Zhang, Y. Li, S. Zhu, and F. Wang, Surf. Coat. Technol., 182, 192, 2004.
8. M. Suzuki, T. Ito, and Y. Taga, Appl. Phys. Lett., 78, 3968, 2001.