Accurate prediction of the Si/ SiO2 interface band offset using the self-consistent ab initio DFT/LDA-1/2 method

Physical Review B - Condensed Matter and Materials Physics

Volumn 79, Issue 24, 2009, Pages

  Ribeiro, Mauro ^a,b   Fonseca, Leonardo R C ^a   Ferreira, Luiz G ^b  

^a Wernher von Braun Center for Advanced Research   (Brazil)

^b UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 68949149517     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.79.241312     Document Type: Article

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