Plasmonic behavior of Ag/dielectric nanowires and the effect of geometry

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 4, 2009, Pages 2055-2061

  Prokes, S M ^a   Alexson, D ^a   Glembocki, O J ^a   Park, H D ^a   Rendell, R W ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE NANOWIRES; CONTROLLED CONDITIONS; E-BEAM LITHOGRAPHY; EX SITU; FABRICATED ARRAYS; HIGH ELECTRIC FIELDS; IN-SITU GROWTH; NANOWIRE ARRAYS; SERS ENHANCEMENT; SURFACE ENHANCED RAMAN; THREE DIMENSIONAL GEOMETRY;

COMPUTATIONAL GEOMETRY; ELECTRIC FIELDS; NANOWIRES; PLASMONS; SURFACES;

ELECTRIC WIRE;

EID: 68349127558     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3130150     Document Type: Article

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