Removal of NO by simultaneous action of dielectric-barrier discharge and TiO2 photocatalyst

EPJ Applied Physics

Volumn 47, Issue 2, 2009, Pages

  Jogi I ^a   Bichevin, V ^a   Laan, M ^a   Haljaste, A ^a   Kaambre H ^a   Sabre, V ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBED OXYGEN; CONCENTRATION OF; DIELECTRIC BARRIER DISCHARGES; INLET GAS COMPOSITION; INPUT ENERGY; NO OXIDATION; OPTICAL ABSORPTION SPECTROSCOPY; POSITIVE EFFECTS; SURFACE STATE; TIO;

DIELECTRIC MATERIALS; GAS ABSORPTION; OXIDATION; OZONE; PHOTOCATALYSIS; PLASMAS; SURFACE REACTIONS;

ABSORPTION SPECTROSCOPY;

EID: 68349093766     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap/2009089     Document Type: Conference Paper

References (16)

1. A.C. Gentile, M.J. Kushner, J. Appl. Phys. 78, 2074 (1995)
2. B.M. Penetrante, M.C. Hsiao, T. Merritt, G.E. Vogtlin, P.H.Wallman, M. Neiger, O.Wolf, T. Hammer, S. Broer, Appl. Phys. Lett. 68, 3719 (1996)
3. C.R. McLarnon, B.M. Penetrante, SAE Paper No. 982433 (1998)
4. I.P. Vinogradov, K. Wiesemann, Plasma Sources Sci. Technol. 6, 307 (1997)
5. F. Fresnet, G. Baravian, S. Pasquiers, C. Postel, V. Puech, A. Rousseau, M. Rozoy, J. Phys. D: Appl. Phys. 33, 1315 (2000)
6. S. Barman, L. Philip, Environ. Sci. Technol. 40, 1035 (2006)
7. T.H. Lim, S.M. Jeong, S.D. Kim, J. Gyenis, J. Photochem. Photobiol. A: Chem. 134, 209 (2000)
8. S. Devahasdin, C. Fan, K. Li, D.H. Chen, J. Photochem. Photobiol. A: Chem. 156, 161 (2003)
9. H.H. Kim, K. Tsunoda, S. Katsura, A.A. Mizuno, IEEE Trans. Plasma. Sci. 35, 1306 (1999)
10. S. Daito, F. Tochikubo, T. Watanabe, Jpn J. Appl. Phys. 40, 2475 (2001)
11. S. Iwasaki, Y. Ehara, H. Kishida, S. Ono, T. Ito, in Symp. High Pressure, Low Temperature Plasma Chemistry (HAKONE IX), Padua, Italy, 2004 (7th topic, oral presentation number 3)
12. H. Kim, H. Jun, Y. Sakaguchi, W. Minami, Plasma Sci. Technol. 10, 53 (2008)
13. O. Guaitella, F. Thevenet, C. Guillard, A. Rousseau, J. Phys. D: Appl. Phys. 39, 2964 (2006)
14. I. Jõgi, V. Bichevin, M. Laan, A. Haljaste, H. Käämbre, Plasma Chem. Plasma Process. (in press), DOI 10.1007/s11090-009-9171-5
15. O. Guaitella, F. Thevenet, E. Puzenat, C. Guillard, A. Rousseau, Appl. Catal. B: Environ. 89, 296 (2008)
16. O. Guaitella, K. Allegraud, C. Lazzaroni, A. Rousseau, in XXVII Int. Conf. Phenomena in Ionized Gases (ICPIG), (Institute of Plasma Physic AS CR, v.v.1, Prague, 2007), http://icpig2007.ipp.cas.cz/files/download/cd-cko/ ICPIG2007/Proceedings-ICPIG2007.html