Seebeck coefficient of ultrathin silicon-on-insulator layers

Applied Physics Express

Volumn 2, Issue 7, 2009, Pages

  Salleh, Faiz ^a   Asai, Kiyosumi ^a   Akihiro Ishida, ^a   Ikeda, Hiroya ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DOPING LEVELS; IMPURITY BANDS; IMPURITY CONCENTRATION; ULTRATHIN SILICON;

DOPING (ADDITIVES); MICROSENSORS; PHOSPHORUS; SEMICONDUCTOR MATERIALS;

SEEBECK COEFFICIENT;

EID: 68249118686     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.071203     Document Type: Article

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