Plasma treatment effects on surface morphology and field emission characteristics of carbon nanotubes

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue 9, 2009, Pages 851-857

  Lee, Shih Fong ^a   Chang, Yung Ping ^a   Lee, Li Ying ^a  

^a DA YEH UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE DIAMETER; BEFORE AND AFTER; CARBON NANOTUBE FILMS; DENSITY OF DEFECTS; ELECTRON FIELD; EMISSION CURRENT; ETCHING EFFECT; FIELD-EMISSION CHARACTERISTICS; FIELD-EMISSIONS; HIGH ELECTRIC FIELDS; NICKEL CATALYST; PLASMA TREATMENT; REACTIVE PLASMAS; RESEARCH RESULTS; SILICON SUBSTRATES; TETRAFLUOROMETHANE; THERMAL DECOMPOSITIONS; THREE ORDERS OF MAGNITUDE; TURN-ON ELECTRIC FIELD;

ARGON; CARBON FILMS; CARBON NANOTUBES; CATALYSTS; DEFECT DENSITY; ELECTRIC FIELDS; FIELD EMISSION; HYDROGEN; METHANE; MORPHOLOGY; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; PLASMA ETCHING; PLASMAS; PYROLYSIS; REACTION KINETICS;

SURFACE MORPHOLOGY;

EID: 68249083584     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9805-z     Document Type: Article

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