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Physica E: Low-Dimensional Systems and Nanostructures

Volumn 28, Issue 1, 2005, Pages 88-92

Effects of argon plasma treating on surface morphology and gas ionization property of carbon nanotubes

(4) Yan, Bingyong a Qian, Kaiyou a Zhang, Yafei a Xu, Dong a

a Shanghai Jiao Tong University (China)

Author keywords

Argon plasma process; Carbon nanotube; Gas ionization; Surface treatment

Indexed keywords

ARGON; CHEMICAL SENSORS; ELECTRIC FIELDS; ELECTRIC POTENTIAL; IONIZATION OF GASES; PLASMA APPLICATIONS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE TREATMENT; SURFACES;

ARGON PLASMA PROCESS; FILM SURFACES; IONIZATION VOLTAGE; MULTIWALLED CARBON NANOTUBES (MWNT);

CARBON NANOTUBES;

EID: 18544365499 PISSN: 13869477 EISSN: None Source Type: Journal
DOI: 10.1016/j.physe.2005.02.004 Document Type: Article

Times cited : (20)

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