Electron translocation and field emission in printed CNT film by high-temperature sintering and post-treatment

Microelectronics Journal

Volumn 40, Issue 8, 2009, Pages 1166-1169

  Zhang, Xiu Xia ^a,b   Zhu, Chang Chun ^a  

^a Northern Nationalities University   (China)

^b XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Carbon nanotube film; Electron tunneling; Field emission; Post treatment; Screen print; Sintering

Indexed keywords

BINDING MATERIALS; CARBON NANOTUBE FILM; CARBON NANOTUBE FILMS; CNT FILMS; FIELD-EMISSION CURRENT DENSITY; HIGH-TEMPERATURE SINTERING; LONG LIFETIME; MECHANICAL SHEARING; POST-TREATMENT; POTENTIAL BARRIERS; SCREEN PRINT;

CARBON NANOTUBES; ELECTRONS; FIELD EMISSION; NUCLEAR PHYSICS; SCREEN PRINTING; SHEARING; TUNNELING (EXCAVATION); WIND TUNNELS;

SINTERING;

EID: 67651172977     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2007.07.073     Document Type: Article

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