Characteristics of focused ion beam nanoscale Josephson devices

Superconductor Science and Technology

Volumn 22, Issue 6, 2009, Pages

  Hao, L ^a   Cox, D C ^a,b   Gallop, J C ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPES; BEAM TRACKS; ION MILLING; JOSEPHSON; JOSEPHSON DEVICES; LOW NOISE; MICRO-BRIDGE; NANO ELECTROMECHANICAL SYSTEMS; NANO SCALE; NANOMAGNETISM; OPERATING TEMPERATURE; OPTICAL LITHOGRAPHY; QUANTUM METROLOGY; QUANTUM-INFORMATION PROCESSING; SINGLE PARTICLE; SINGLE PHOTON DETECTION; SPINTRONICS; SUPERCONDUCTING PROPERTIES; SUPERCONDUCTING QUANTUM INTERFERENCE DEVICE; SUPERCONDUCTING TECHNOLOGY; VERY LOW NOISE; WEAK LINKS;

ATOMS; DATA PROCESSING; ELECTRIC POTENTIAL; FOCUSED ION BEAMS; IONS; JOSEPHSON JUNCTION DEVICES; NANOSTRUCTURED MATERIALS; NIOBIUM; PHOTOLITHOGRAPHY; PHOTONS; QUANTUM INTERFERENCE DEVICES; QUANTUM OPTICS; SUPERCONDUCTIVITY; YTTERBIUM COMPOUNDS;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 67650757262     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/22/6/064011     Document Type: Article

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