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Volumn 4, Issue 6, 2009, Pages 984-988
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Fabrication and application of TiO2-based superhydrophilic- superhydrophobic patterns on titanium substrates for offset printing
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Author keywords
Patterning; Photochemistry; Surface chemistry; Titanium; Wettability
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Indexed keywords
DIFFERENCE IMAGES;
FABRICATION PROCESS;
HIGH RESOLUTION;
INK-JET;
PATTERNING;
PHOTOCATALYTIC DECOMPOSITION;
PHOTOCHEMISTRY;
PRINTED IMAGES;
SITE SELECTIVE;
SUPER-HYDROPHILIC;
SUPERHYDROPHOBIC;
TIO;
TIO2 PHOTOCATALYST;
TITANIUM SUBSTRATES;
UV IRRADIATION;
WETTABILITY;
CAPILLARITY;
DECOMPOSITION;
HYDROPHOBICITY;
IMAGE QUALITY;
IRRADIATION;
LITHOGRAPHY;
MONOLAYERS;
PHOTOCATALYSIS;
PRINTING;
SURFACE CHEMISTRY;
TITANIUM;
SUBSTRATES;
TITANIUM;
TITANIUM DIOXIDE;
ARTICLE;
CATALYSIS;
CHEMISTRY;
HYDROPHOBICITY;
PRINTING;
ULTRAVIOLET RADIATION;
X RAY DIFFRACTION;
CATALYSIS;
HYDROPHOBICITY;
PRINTING;
TITANIUM;
ULTRAVIOLET RAYS;
X-RAY DIFFRACTION;
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EID: 67650697974
PISSN: 18614728
EISSN: 1861471X
Source Type: Journal
DOI: 10.1002/asia.200900005 Document Type: Article |
Times cited : (52)
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References (21)
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