Alternative models for determining the surface energy components in offset printing

Journal of Colloid and Interface Science

Volumn 301, Issue 2, 2006, Pages 668-676

  Jarn M ^a   Tag C M ^a   Jarnstrom J ^a   Granqvist, B ^a   Rosenholm, J B ^a  

^a ÅBO AKADEMI UNIVERSITY   (Finland)

Author keywords

Acid base; Adhesion; Contact angle; Offset printing; Roughness; Surface energy

Indexed keywords

ADHESION; CONTACT ANGLE; INTERFACIAL ENERGY; PAPER; SUBSTRATES; SURFACE ROUGHNESS;

ACID-BASE; NEGATIVE SQUARE ROOTS; OSS-CHAUDHURY-GOOD BI-BIDENTATE MODEL (VOCG);

OFFSET PRINTING;

ACID BASE BALANCE; ARTICLE; ATOMIC FORCE MICROSCOPY; CALCULATION; ENERGY; MODEL; PAPER; PRINTING; PRIORITY JOURNAL;

OFFSET PRINTING; PAPER;

EID: 33746928357     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2006.05.018     Document Type: Article

References (28)

1. Holland C. In: Swinden P., and Taylor A. (Eds). Profit through Innovation (2001), Pira International/Atalink Ltd., London 50
2. N. Triantafillopoulos, D.M. Lee, in: TAGA Proceedings, 1996
3. Mac Phee J. Fundamentals of Lithographic Printing. 1. Mechanisms of Printing (1998), GATF Press, Pittsburg
4. Kaelble D.H., and Dynes P.J. In: Lee L.H. (Ed). Adhesion Science and Technology vol. 9b (1975), Plenum, New York 735
5. R. Krishnan, D. Klein, in: TAGA Proceedings, 1991, p. 478
6. Ström G. J. Pulp Pap. Sci. 19 (1993) J79
7. Lyne M.B., and Huang Y.C. Nord. Pulp Pap. Res. J. 8 (1993) 120
8. Al-Turaif H., Unertl W.N., and Lepoutre P. J. Adhes. Sci. Technol. 9 (1995) 801
9. Huang Y., Gardner D.J., Chen M., and Biermann J. J. Adhes. Sci. Technol. 9 (1995) 1403
10. Baudin G. Acta Graph. 11 (1999) 113
11. Shen W., Filonanko Y., Truong Y., Parker I.H., Brack N., Pigram P., and Liesegang J. Colloids Surf. A Physicochem. Eng. Aspects 173 (2000) 117
12. B. Granqvist, M. Järn, J.B. Rosenholm, Adv. Colloid Interface Sci., submitted for publication
13. Della Volpe C., and Siboni S. J. Colloid Interface Sci. 195 (1997) 121
14. Drago R.S., and Wayland B. J. Am. Chem. Soc. 87 (1965) 3571
15. Drago R.S., Vogel G.C., and Needham T.E. J. Am. Chem. Soc. 93 (1971) 6014
16. Moderessi H., and Garnier G. Langmuir 18 (2002) 642
17. Image Metrology, The Scanning Probe Image Processor, SPIP, User's and Reference Guide, Copenhagen, 2001
18. J.B. Rosenholm, in: T.F. Tadros (Ed.), Colloid Stability-The Role of Surface Forces, in press
19. van Oss C.J., Chadhury M.J., and Good R.J. Adv. Colloid Interface Sci. 28 (1987) 35
20. van Oss C.J., Chadhury M.J., and Good R.J. Chem. Rev. 88 (1988) 927
21. Harkins W.D., and Feldman A. J. Am. Chem. Soc. 44 (1922) 2665
22. Zettlemoyer A.C. In: Fowkes F.M. (Ed). Hydrophobic Surfaces (1969), Academic Press, New York 1-27
23. Lee L.-H. Langmuir 12 (1996) 1681
24. Shen Q. Langmuir 16 (2000) 4394
25. Wenzel R.W. Ind. Eng. Chem. 28 (1936) 988
26. Bico J., Thiele U., and Quéré D. Colloids Surf. A Physicochem. Eng. Aspects 206 (2002) 41
27. Cassie A.B.D., and Baxter S. Trans. Faraday Soc. 40 (1944) 546
28. van Oss C.J., and Good R.J. In: Schrader M.E., and Loeb G. (Eds). Modern Approaches to Wettability: Theory and Applications (1991), Plenum, New York 1-27