Corrigendum to "Low-temperature deposition of (1 1 0) and (1 0 1) rutile TiO2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite" [Mater. Chem. Phys. 117 (2009) 288-293] (DOI:10.1016/j.matchemphys.2009.06.002);Low-temperature deposition of (1 1 0) and (1 0 1) rutile TiO2 thin films using dual cathode DC unbalanced magnetron sputtering for inducing hydroxyapatite

Materials Chemistry and Physics

Volumn 117, Issue 1, 2009, Pages 288-293

  Kasemanankul, Prasertsak ^a   Witit Anan, Nirun ^b   Chaiyakun, Surasing ^b   Limsuwan, Pichet ^a   Boonamnuayvitaya, Virote ^a  

^a KING MONGKUT'S UNIVERSITY OF TECHNOLOGY THONBURI   (Thailand)

^b BURAPHA UNIVERSITY   (Thailand)

Author keywords

Apatite; Deposition; Rutile; Sputtering; Titanium dioxide

Indexed keywords

APATITE; CATHODES; DEPOSITION; FILM PREPARATION; HEAT TREATMENT; HYDROXYAPATITE; LOW TEMPERATURE OPERATIONS; MAGNETRON SPUTTERING; OXIDE MINERALS; PHOSPHATE MINERALS; SPUTTERING; TEMPERATURE; TITANIUM DIOXIDE;

HIGH CRYSTALLINITY; HIGH-ENERGY PARTICLES; LOW-TEMPERATURE DEPOSITION; RUTILE; SIMULATED BODY FLUIDS; TITANIUM DIOXIDES (TIO2); UNBALANCED MAGNETRON SPUTTERING; VARIOUS SUBSTRATES;

THIN FILMS;

EID: 67650272356     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.09.018     Document Type: Erratum

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