1D-photonic crystals prepared from the amorphous chalcogenide films

Journal of Materials Science: Materials in Electronics

Volumn 20, Issue SUPPL. 1, 2009, Pages

  Kohoutek, Tomas ^a,b   Orava, Jiri ^b   Wagner, Tomas ^b   Hrdlička, Martin ^b   Vlcek, Milan ^b   Frumar, Miloslav ^b  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b UNIVERSITY OF PARDUBICE   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

1-D PHOTONIC CRYSTAL; AMORPHOUS CHALCOGENIDE FILMS; ANGULAR DEPENDENCE; CHALCOGENIDE FILMS; DIELECTRIC MIRRORS; FIRST ORDER; GLASS SUBSTRATES; GOOD OPTICAL QUALITY; HIGH REFRACTIVE INDEX; LOW REFRACTIVE INDEX; NEAR INFRARED REGION; NEAR-INFRARED RANGE; NORMAL INCIDENCE; OPTICAL REFLECTIVITY; P-POLARIZATION; QUARTER-WAVE STACK CONDITION; S-LAYERS; SPECTRAL ELLIPSOMETRY; STOP-BANDS; THERMAL EVAPORATION METHOD; TOTAL REFLECTION; UNPOLARIZED LIGHT;

AMORPHOUS FILMS; FILM PREPARATION; GERMANIUM; INFRARED DEVICES; LIGHT REFLECTION; LIGHT REFRACTION; MIRRORS; PHOTONIC CRYSTALS; REFLECTION; REFRACTIVE INDEX; REFRACTOMETERS; SELENIUM COMPOUNDS; THERMAL EVAPORATION;

OPTICAL FILMS;

EID: 67650171762     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-008-9619-z     Document Type: Conference Paper

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