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Volumn 86, Issue 4-6, 2009, Pages 573-576
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Interferential lithography of 1D thin metallic sinusoidal gratings: Accurate control of the profile for azimuthal angular dependent plasmonic effects and applications
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Author keywords
Gratings; Interference lithography; Plasmonic crystals; Simulation
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Indexed keywords
AMPLITUDE OSCILLATIONS;
AZIMUTHAL ANGLES;
BI LAYERS;
BIO-SENSING;
CONTRAST STUDIES;
CONTROL OF THE PROFILES;
DIFFRACTED EFFICIENCIES;
FILM THICKNESS;
GRATINGS;
INTERFERENCE LITHOGRAPHY;
METALLIC GRATINGS;
METALLIC LAYERS;
NON-LINEAR PROCESS;
NUMERICAL MODELS;
OPTICAL COUPLINGS;
OPTIMIZATION PROCESS;
PLASMONIC CRYSTALS;
ROUGHNESS SURFACES;
SIMULATION;
SINUSOIDAL GRATINGS;
SINUSOIDAL SURFACES;
SPECIFIC HARMONICS;
SPECULAR REFLECTIVITIES;
SURFACE PLASMON POLARITONS;
CRYSTALS;
DIFFRACTION GRATINGS;
PHOTOLITHOGRAPHY;
PLASMONS;
REFLECTION;
SURFACE PLASMON RESONANCE;
SURFACE ROUGHNESS;
SILVER;
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EID: 67349260425
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2009.01.080 Document Type: Article |
Times cited : (23)
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References (15)
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