Study of the optimal condition for electroplating of Bi 2S 3 thin films and their photoelectrochemical characteristics

Journal of Solid State Electrochemistry

Volumn 13, Issue 9, 2009, Pages 1339-1350

  Jana, Atanu ^a   Bhattacharya, Chinmoy ^a   Sinha, Subrata ^b   Datta, Jayati ^a  

^a INDIAN INSTITUTE OF ENGINEERING SCIENCE AND TECHNOLOGY   (India)

^b Mahadebananda Mahavidyalaya ^*  (India)

Author keywords

Electrochemical deposition; Electrochemical impedance spectroscopy; Nanocrystalline Bi 2S 3 thin films; Photoelectrochemical cell; TG DTA

Indexed keywords

BAND GAP ENERGY; BISMUTH SULFIDE; CHEMICAL COMPOSITIONS; COMPLEXING AGENTS; DONOR DENSITY; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY MEASUREMENTS; ENERGY DISPERSIVE ANALYSIS OF X-RAYS; FILM MATRIX; FOUR-PROBE MEASUREMENT; MOTT-SCHOTTKY PLOTS; NANOCRYSTALLINE BI 2S 3 THIN FILMS; NON-AQUEOUS; NYQUIST; OPTIMAL CONDITIONS; PHOTOACTIVITY; PHOTOELECTROCHEMICAL APPLICATIONS; PHOTOELECTROCHEMICAL CHARACTERISTICS; PRECURSOR SALTS; ROOM TEMPERATURE; SCANNING ELECTRONS; SEMI-CONDUCTING PROPERTY; TG-DTA; THERMOGRAVIMETRY; TRIETHANOL; TRITON-X; UV-VIS SPECTROSCOPY;

AMINES; BISMUTH; DIMETHYL SULFOXIDE; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL PROPERTIES; ELECTRODEPOSITION; METAL ANALYSIS; NANOCRYSTALLINE MATERIALS; PHOTOELECTROCHEMICAL CELLS; REDUCTION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SOLAR ENERGY; SPECTRUM ANALYSIS; SURFACE ACTIVE AGENTS; SURFACE TENSION; THERMOANALYSIS; THIN FILMS; THIOUREAS; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY; UREA; X RAY DIFFRACTION ANALYSIS;

ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY;

EID: 67649891828     PISSN: 14328488     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10008-008-0679-z     Document Type: Article

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