Nonlinear photoionization and laser-induced damage in silicate glasses by infrared ultrashort laser pulses

Applied Physics B: Lasers and Optics

Volumn 96, Issue 1, 2009, Pages 127-134

  Siiman, L A ^a   Lumeau, J ^a   Glebov, L B ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

1550 NM; FREE-ELECTRON DENSITY; GLASS MATRICES; INTRINSIC LUMINESCENCE; LASER INTENSITIES; LASER SHOTS; LASER-INDUCED DAMAGE; MULTICOMPONENT; NEW APPROACHES; NUMERICAL APERTURE; PHOTO-THERMO-REFRACTIVE GLASS; SILICATE GLASS; SINGLE-SHOT; THIRD HARMONIC; THIRD HARMONIC GENERATIONS; ULTRASHORT LASER PULSE; WIDE BAND GAP;

FILAMENTS (LAMP); FUSED SILICA; HARMONIC GENERATION; LASER BEAMS; LASER DAMAGE; LASERS; PHOTOIONIZATION; PULSE GENERATORS; PULSED LASER APPLICATIONS; SILICA; SILICATES; ULTRASHORT PULSES;

PHOTOSENSITIVE GLASS;

EID: 67649836072     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-009-3526-8     Document Type: Article

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