Photoelectron spectroscopic studies of the interfacial reaction between glass and commercial adhesive

Surface and Interface Analysis

Volumn 41, Issue 6, 2009, Pages 463-470

  Wang, Y Q ^a   Chen, J ^b   Gao, F ^a   Sherwood, Peter M A ^a  

^a OKLAHOMA STATE UNIVERSITY   (United States)

^b DOW CHEMICAL COMPANY   (United States)

Author keywords

Ab initio calculations; Cluster calculations; Glass; Valence band XPS

Indexed keywords

AB INITIO CALCULATIONS; AB INITIO MOLECULAR ORBITAL CALCULATION; ACRYLIC ACIDS; ADHESION INTERFACES; ADHESION INTERPHASE; CHEMICAL INTERACTIONS; CLUSTER CALCULATIONS; CORE-LEVEL PHOTOELECTRON SPECTROSCOPY; EXPERIMENTAL SPECTRA; GLASS INTERFACE; INTERACTION SCHEMES; INTERFACIAL REACTIONS; INTERFACIAL REGION; LOCTITE; MINOR COMPONENTS; SPECTROSCOPIC STUDIES; SURFACE REGION; TOP SURFACE; UPS SPECTRA; VALENCE BAND SPECTRA; XPS;

ADHESION; CARBOXYLIC ACIDS; ELECTRON SPECTROSCOPY; ELECTRONS; GLASS; MOLECULAR ORBITALS; MOLECULAR SPECTROSCOPY; ORGANIC ACIDS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; POWER SUPPLY CIRCUITS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; TERNARY SYSTEMS; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; ULTRAVIOLET SPECTROSCOPY; UNINTERRUPTIBLE POWER SYSTEMS; VALENCE BANDS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67649784351     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3048     Document Type: Article

References (26)

1. R. A. Marks,D. R. Chapman,D. T.Danielson,Am.Glaeser,ActaMater. 2000, 48, 4425.
2. M.Guichenuy, J. F.Watts, M.-L. Abel, A. M. Brown, M. Audenaert, N. Amouroux, Surf. Interface Anal. 2004, 36, 685.
3. C. Kozlowski, P. M. A. Sherwood, Carbon 1987, 25, 751.
4. T.Wang, P. M. A. Sherwood, Chem.Mater. 1994, 6, 788.
5. T.Wang, P. M. A. Sherwood, Chem.Mater. 1995, 7, 1020.
6. T.Wang, P. M. A. Sherwood, Chem.Mater. 1995, 7, 1031.
7. Y. Q.Wang, F. Q. Zhang, P. M. A. Sherwood, Chem. Mater. 1999, 11, 2573.
8. H. Viswanathan, Y.Q.Wang, A. A. Audi, P. J. Allen, P. M. A. Sherwood, Chem.Mater. 2001, 13, 1647.
9. Y. Q.Wang, F. Q. Zhang, P. M. A. Sherwood, Chem. Mater. 2001, 13, 832.
10. Y. Q. Wang, P. M. A. Sherwood, J. Vac. Sci. Technol. 2003, A21, 1120.
11. A. L. Asunskis, P. M. A. Sherwood, J. Vac. Sci. Technol. 2007, A25, 872.
12. C. L. Weitzsacker, M. Xie, L. T. Drzal, Surf. Interface Anal. 1997, 25, 53.
13. C. U. Gardner, C. S. K. Singamsetty, G. L. Booth, G. R. He, Carbon 1995, 33, 587.
14. M. P. Seah, I. S. Gilmore, G. Beamson, Surf. Interface Anal. 1998, 26, 642.
15. P. M. A. Sherwood, Appendix 3, in Practical Surface Analysis Vol I: AugerandX-rayPhotoelectronSpectroscopy (2nd edn) (Eds:D. Briggs, M. P Seah), Wiley: New York, 1990.
16. R. O. Ansell, T. Dickinson, A. F. Povey, P.M.A.Sherwood,J. Electroanal. Chem. 1979, 98, 79.
17. A. Proctor, P. M. A. Sherwood, Anal. Chem. 1982, 54, 13.
18. C. Pisani, R. Dovesi, C. Roetti Hartree-Fock Ab Initio Treatment of Crystalline systems, LectureNotes in Chemistry, Springer: Berlin, 1988, QCPE 577.
19. V. R. Saunders, R. Dovesi, C. Roetti, M. Causa, N. M. Harrison, R. Orlando, C. M. Zicovidh-Wilson, Crystal 98 User's Manual, University of Torino: Torino, 1998.
20. J. H. Scofield, J. Electron Spectrosc. Relat. Phenom. 1976, 8, 129.
21. J. J. Yeh, I. Lindau, At. Data Nucl. Data Tables 1985, 32, 7.
22. W.H. Baur, E. Halwax,H. V̈ ollenkle, Monatsh. Chem. 1986, 117, 793.
23. M. A. Rooke, P. M. A. Sherwood, Surf. Interface Anal. 1994, 21, 681.
24. X. L. Li,W. Q. Xu, H. Y. Jia, X. Wang, B. Zhao, B. F. Li, Y. Ozaki, J.Colloid Interface Sci. 2004, 274, 9.
25. H. Seyama, D. Wang, M. Soma, Surf. Interface Anal. 2004, 36, 609.
26. Y. Duval, J. A. Mielczarski, O. S. Pokrovsky, E. Mielczarski, J. J. Ehrhardt, J. Phys. Chem. B 2002, 106, 2937.