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Journal of Materials Science

Volumn 44, Issue 14, 2009, Pages 3731-3735

Effect of the titanium ion concentration on electrodeposition of nanostructured TiNi films

(5) Lee, Hae Min a Mahapatra, Santosh K a,b Anthony, John Kiran a Rotermund, Fabian a Kim, Chang Koo a

a Ajou University (South Korea)

b BIRLA INSTITUTE OF TECHNOLOGY (India)

Author keywords

[No Author keywords available]

Indexed keywords

BLUE SHIFT; CONCENTRATION OF; CRYSTALLOGRAPHIC ORIENTATIONS; FILM CHARACTERISTICS; NANO-STRUCTURED; NANOSTRUCTURED TITANIUM; OXIDES OF TITANIUM; TI-NI FILM; TITANIUM CONTENT; TITANIUM ION CONCENTRATION; TITANIUM SOURCE; TITANIUM-NICKEL; XRD STUDIES;

CONCENTRATION (PROCESS); CORROSION; CRYSTALLITE SIZE; ELECTRODEPOSITION; IONS; METALLIC FILMS; NICKEL; NICKEL ALLOYS; SCANNING ELECTRON MICROSCOPY; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

TITANIUM OXIDES;

EID: 67649404625 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-009-3498-4 Document Type: Article

Times cited : (8)

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