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Volumn 21, Issue 12, 2009, Pages 820-822

Three-dimensional tapered spot-size converter based on (111) silicon-on-insulator

Author keywords

Anisotropic etching; Etching; Loss measurement; Optical fiber devices; Optical waveguides; Silicon; Silicon on insulator (SOI); Spot size converter (SSC); Surface treatment; Three dimensional displays

Indexed keywords

LOSS MEASUREMENT; OPTICAL FIBER DEVICES; SILICON-ON-INSULATOR (SOI); SPOT-SIZE CONVERTER (SSC); THREE DIMENSIONAL DISPLAYS;

EID: 67649300713     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2009.2019619     Document Type: Article
Times cited : (21)

References (8)
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  • 4
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    • presented at the San Jose, CA, Jan. 25-31
    • J. J. Fijol, E. E. Fike, P. B. Keating, D. Gilbody, J. LeBlanc, S. A. Jacobson, W. J. Kessler, and M. B. Frish, "Fabrication of silicon-on-insulator adiabatic tapers for low loss optical interconnection of photonic devices," presented at the Photonics West San Jose, CA, Jan. 25-31, 2003.
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    • Fijol, J.J.1    Fike, E.E.2    Keating, P.B.3    Gilbody, D.4    LeBlanc, J.5    Jacobson, S.A.6    Kessler, W.J.7    Frish, M.B.8
  • 5
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    • Vertical InP/InGaAsP tapers for low-loss optical fiber-waveguide coupling
    • T. Brenner, W. Hunziker, M. Smit, M. Bachmann, G. Guekos, and H. Melchior, "Vertical InP/InGaAsP tapers for low-loss optical fiber-waveguide coupling," Electron. Lett., vol. 28, pp. 2040-2041, 1992.
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    • Brenner, T.1    Hunziker, W.2    Smit, M.3    Bachmann, M.4    Guekos, G.5    Melchior, H.6
  • 6
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    • Fabrication and characterization of three-dimensional silicon tapers
    • Dec
    • A. Sure, T. Dillon, J. Murakowski, C. Lin, D. Pustai, and D. W. Prather, "Fabrication and characterization of three-dimensional silicon tapers," Opt. Express, vol. 11, no. 26, pp. 3555-3561, Dec. 2003.
    • (2003) Opt. Express , vol.11 , Issue.26 , pp. 3555-3561
    • Sure, A.1    Dillon, T.2    Murakowski, J.3    Lin, C.4    Pustai, D.5    Prather, D.W.6
  • 7
    • 0018030427 scopus 로고
    • Anisotropic etching of silicon
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    • K. E. Bean, "Anisotropic etching of silicon," IEEE Trans. Electron Devices, vol. ED-25, no. 10, pp. 1185-1193, Oct. 1978.
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  • 8
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    • Micromorphology of single crystalline silicon surfaces during anisotropic wet chemical etching in KOH and TMAH
    • E. van Veenendaal, K. Sato, M. Shikida, and J. van Suchtelen, "Micromorphology of single crystalline silicon surfaces during anisotropic wet chemical etching in KOH and TMAH," Sens. Actuators A, Phys., vol. 93, pp. 219-231, 2001.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.