Role of PbO-based glass frit in Ag thick-film contact formation for crystalline Si solar cells

Metals and Materials International

Volumn 15, Issue 2, 2009, Pages 307-312

  Hong, Kyoung Kook ^a   Cho, Sung Bin ^a   Huh, Joo Youl ^a   Park, Hyun Jung ^b   Jeong, Ji Weon ^b  

^a Korea University   (South Korea)

^b LG Electronics Inc   (South Korea)

Author keywords

Ag crystallite; Ag thick film contact; Glass frit; Interfacial reaction; Si solar cells

Indexed keywords

CRYSTALLITES; FLUIDIZATION; GLASS; LEAD OXIDE; SILICON WAFERS; SILVER; SURFACE CHEMISTRY; THICK FILMS;

AG THICK FILM; CRYSTALLINE SI SOLAR CELLS; FIRING TEMPERATURE; GLASS FRIT; LOWER VISCOSITIES; SCREEN-PRINTED THICK FILMS; SI SOLAR CELLS; SUBSEQUENT COOLING;

SILICON SOLAR CELLS;

EID: 67649124142     PISSN: 15989623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12540-009-0307-1     Document Type: Article

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