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Journal of Electroceramics

Volumn 22, Issue 4, 2009, Pages 416-420

Optical properties of BaTiO3 thin films: Influence of oxygen pressure utilized during pulsed laser deposition

(7) Hiltunen, J a,b Seneviratne, D a Sun, R a Stolfi, M a Tuller, H L a Lappalainen, J c Lantto, V c

a Massachusetts Institute of Technology (United States)

b VTT TECHNICAL RESEARCH CENTRE OF FINLAND (Finland)

c UNIVERSITY OF OULU (Finland)

Author keywords

BaTiO3; Birefringence; Electro optic; Thin film

Indexed keywords

BATIO3; C-AXIS ORIENTED FILM; CRYSTAL REORIENTATION; CRYSTALLOGRAPHIC PROPERTIES; DEPOSITED FILMS; EFFECTIVE ELECTRO-OPTIC COEFFICIENT; ELECTRO-OPTIC; ELECTRO-OPTIC PROPERTIES; ELECTRO-OPTIC WAVEGUIDE MODULATORS; INFLUENCE OF OXYGEN; LOW LEVEL; LOW PRESSURES; MACH-ZEHNDER; MGO SUBSTRATE; OPTICAL APPLICATIONS; OPTICAL BIREFRINGENCE; OXYGEN PRESSURE; TETRAGONAL DISTORTION;

BARIUM COMPOUNDS; BIREFRINGENCE; ELECTROOPTICAL DEVICES; INTEGRATED OPTICS; LIGHT MODULATORS; OXYGEN; PULSED LASER DEPOSITION; THIN FILM DEVICES; THIN FILMS;

OPTICAL FILMS;

EID: 67649086170 PISSN: 13853449 EISSN: 15738663 Source Type: Journal
DOI: 10.1007/s10832-008-9463-9 Document Type: Article

Times cited : (9)

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