Chemical Bath Deposition of tin sulphide thin films in acid solution

Comptes Rendus Chimie

Volumn 12, Issue 6-7, 2009, Pages 824-827

  Mnari, M ^a   Kamoun, N ^a   Bonnet, J ^b   Dachraoui, M ^a  

^a FACULTÉ DES SCIENCES DE TUNIS   (Tunisia)

^b UNIVERSITÉ MONTPELLIER II   (France)

Author keywords

Chemical Bath Deposition in acid solution; Chemical composition; Roughness; Thin films; Tin sulphide

Indexed keywords

EID: 67349273757     PISSN: 16310748     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.crci.2009.01.005     Document Type: Article

References (16)

1. Engelken R.D., McCloud H.E., Lee C., Slayton M., and Ghoreishi H.J. Electrochem. Soc. 134 (1987) 2696
2. Pramanik P., Basu P.K., and Biswas S. Thin Solid Films 150 (1987) 269
3. Nair M.T.S., and Nair P.K. Semicond. Sci. Technol. 6 (1991) 132
4. Nair P.K., Nair M.T.S., and Campos J. J. Electrochem. Soc. 140 (1993) 1085
5. Nair P.K., Nair M.T.S., Zingaro R.A., and Meyers E.A. Thin Solid Films 239 (1994) 85
6. Lopez S., and Ortiz A. Semicond. Sci. Technol. 9 (1994) 2130
7. Zainal Z., Hussein M.Z., and Guazali A. Sol. Energy Mater. Sol. Cells 40 (1996) 347
8. Ortiz A., Alonso J.C., Garcia M., and Toriz J. Semicond. Sci. Technol. 11 (1996) 243
9. Zainal Z., Hussein M.Z., Kassim A., Guazali A., and Mat J. Sci. Lett. 16 (1997) 1446
10. Johnsonj B., Jones H., Latham B.S., Parker J.D., Engelken R.D., and Barber C. Semicond. Sci. Technol. 14 (1999) 501
11. Thangaraju B., and Kaliannan P. J. Phys. D: Appl. Phys. 33 (2000) 1054
12. Jayachandran M., Mohan S., Subramanian B., Sanjeeviraja C., and Ganesan V. J. Mater. Sci. Lett. 20 (2000) 381
13. Tanusevski A. Semicond. Sci. Technol. 18 (2003) 501
14. Pourbauix M., Zoubov N., and Van Muylder J. Atlas des équilibres électrochimiques à 25 °C (1963), Gautier - Villars & Cie, Paris
15. Mnari M., Cros B., Amlouk M., Bbelgacem S., and Barjon D. Can. J. Phys. 77 (1999) 705
16. Lide D.R. Handbook of Chemistry and Physics. seventy-third ed. (1992-1993), CRC Press, London