Multicolored devices fabricated by direct lithography of colloidal nanocrystals

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1127-1130

  Qualtieri, Antonio ^a   Martiradonna, Luigi ^a   Stomeo, Tiziana ^a   Todaro, Maria Teresa ^a   Cingolani, Roberto ^a   Vittorio, Massimo De ^a  

^a NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

Author keywords

Colloidal nanocrystals; E beam lithography; Multicolor display; Photolithography; Resist

Indexed keywords

ACTIVE MEDIUMS; COLLOIDAL NANOCRYSTALS; COLORED PIXELS; CONCENTRATION RATIOS; E-BEAM LITHOGRAPHY; ELECTRICAL INJECTIONS; ETCHING PROCESS; FABRICATION COSTS; FINE TUNING; HIGH DEFINITIONS; MIX AND MATCHES; MULTI STEPS; MULTICOLOR DISPLAY; NANO-ELECTRONIC DEVICES; OPTICALLY PUMPED; OPTO-ELECTRONIC PROPERTIES; RESIST; TUNABILITY;

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRONIC PROPERTIES; LIGHT; LIGHT EMITTING DIODES; LIGHTING; NANOCRYSTALS; PIXELS; SUBSTRATES; SURFACE TREATMENT;

FABRICATION;

EID: 67349266981     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.11.073     Document Type: Article

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