SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 36, Issue 9, 2004, Pages 1335-1339

Electrochromic nickel oxide films made by reactive r.f. sputtering from different targets

(3) Ottaviano, L a Pennisi, A a,b,c Simone, F b,c

a CNR (Italy)

b INFM (Italy)

c UNIVERSITY OF CATANIA (Italy)

Author keywords

Electrochromism; Nickel oxide; Optical properties; r.f. sputtering

Indexed keywords

DEPOSITION; ELECTROCHEMISTRY; ELECTROCHROMISM; MICROSTRUCTURE; MIXTURES; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; STOICHIOMETRY; THIN FILMS;

ELECTROCHEMICAL CYCLIZATION; NICKEL OXIDE; RADIOFREQUENCY (R.F.) SPUTTERING;

NICKEL COMPOUNDS;

EID: 4644279877 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1922 Document Type: Article

Times cited : (11)

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