Photoelectrochromic properties of NiO film deposited on an N-doped TiO2 photocatalytical layer

Journal of Physics and Chemistry of Solids

Volumn 70, Issue 3-4, 2009, Pages 745-749

  Huang, H ^a   Lu, S X ^a   Zhang, W K ^a   Gan, Y P ^a   Wang, C T ^a   Yu, L ^a   Tao, X Y ^a  

^a ZHEJIANG UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

A. Semiconductors; A. Thin films; B. Chemical synthesis; D. Electrochemical properties; D. Surface properties

Indexed keywords

A. SEMICONDUCTORS; A. THIN FILMS; B. CHEMICAL SYNTHESIS; D. ELECTROCHEMICAL PROPERTIES; D. SURFACE PROPERTIES;

CRYSTALS; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL PROPERTIES; INDIUM; LIGHT; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SEMICONDUCTOR QUANTUM DOTS; SURFACE PROPERTIES; SYNTHESIS (CHEMICAL); THIN FILMS; TIN; TITANIUM COMPOUNDS; TRACE ANALYSIS; TRANSIENT ANALYSIS; X RAY DIFFRACTION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67349224643     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2009.03.002     Document Type: Article

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