Metallic and dielectric photonic crystals with chiral elements by combined nanoimprint and reversal lithography in SU-8

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 619-621

  Lu, Bing Rui ^a   Wan, Jing ^a   Shu, Zhen ^a   Xie, Shen Qi ^a   Chen, Yifang ^b   Huq, Ejaz ^b   Qu, Xin Ping ^a   Liu, Ran ^a  

^a FUDAN UNIVERSITY   (China)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Nanophotoic chiral crystals; Optical chirality; Reversal lithography

Indexed keywords

CHIRAL ELEMENTS; CONVENTIONAL LITHOGRAPHIES; DIELECTRIC PHOTONIC CRYSTALS; FEATURE SIZES; LASER POLARIZATIONS; NANO IMPRINTS; NANO SIZES; NANOIMPRINT PROCESS; NANOPHOTOIC CHIRAL CRYSTALS; NANOPHOTONIC CRYSTALS; NANOPROCESS; NEAR-FIELD LITHOGRAPHIES; OPTICAL CHIRALITY; OPTICAL MEASUREMENTS; REVERSAL LITHOGRAPHY; SYMMETRIC STRUCTURES;

CHIRALITY; CRYSTAL ATOMIC STRUCTURE; ENANTIOMERS; NANOIMPRINT LITHOGRAPHY; OPTICAL DATA PROCESSING; PHOTORESISTS; STEREOCHEMISTRY;

PHOTONIC CRYSTALS;

EID: 67349199990     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.021     Document Type: Article

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