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Volumn 109, Issue 7, 2009, Pages 797-801
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Atomic-scale redistribution of Pt during reactive diffusion in Ni (5% Pt)-Si contacts
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Author keywords
Laser atom probe tomography; Microelectronics; NiSi; Silicides
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Indexed keywords
ACTIVE REGIONS;
IN-SITU;
LASER-ASSISTED;
LOW RESISTIVITIES;
NANO-TRANSISTORS;
NI FILMS;
NISI;
REACTIVE DIFFUSIONS;
TOMOGRAPHIC ATOM PROBES;
AGGLOMERATION;
ATOMS;
LASERS;
MICROELECTRONICS;
NICKEL;
NICKEL COMPOUNDS;
PLATINUM;
PROBES;
SILICIDES;
SILICON;
TOMOGRAPHY;
X RAY DIFFRACTION;
PHASE INTERFACES;
NANOPARTICLE;
NICKEL;
PLATINUM;
SILICON;
ARTICLE;
DIFFUSION;
POLYMERIZATION;
TOMOGRAPHY;
VACUUM;
X RAY DIFFRACTION;
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EID: 67349194308
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ultramic.2009.02.001 Document Type: Article |
Times cited : (14)
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References (23)
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