Patterning on single crystalline silicon by laser scanning and alkaline etching

Applied Surface Science

Volumn 255, Issue 15, 2009, Pages 6857-6861

  Hosono, Takashi ^a   Tokura, Hitoshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

KOH etching; Laser processing; Oxide layer; Surface patterning

Indexed keywords

ELECTROMECHANICAL DEVICES; ETCHING; LASER APPLICATIONS; MEMS; POTASSIUM HYDROXIDE; SILICON; SURFACE ANALYSIS;

COMPLEX PROCESSES; KOH ETCHING; LASER PROCESS; MICRO ELECTRO MECHANICAL SYSTEM; MODIFIED SURFACES; OXIDE LAYER; SINGLE CRYSTALLINE SILICON; SURFACE PATTERNING;

ARGON LASERS;

EID: 67349187265     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.03.005     Document Type: Article

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